Title:
PHOTOPOLYMERIZATION INITIATOR
Document Type and Number:
Japanese Patent JP2003096120
Kind Code:
A
Abstract:
To provide a photosensitive resin composition which has a high developing rate, is excellent in tinting reliability, and hardly stains a plating bath; and a photosensitive element using the same.
The resin composition contains a photopolymerization initiator which contains (c1) a hexaarylbiimidazole, (c2) an aromatic ketone represented by formula (IV) (wherein R5, R6, R7, and R8 are each H or a 1-4C alkyl), and (c3) an arylglycine compound represented by formula (V): R9-NHCH2COO-R10 (wherein R9 is an optionally alkylated aryl; and R10 is H or an alkyl).
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Inventors:
ENDO MASAKI
SEKIGUCHI YUICHI
SEKIGUCHI YUICHI
Application Number:
JP2002231141A
Publication Date:
April 03, 2003
Filing Date:
September 12, 1997
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/029; C08F2/50; G03F7/031; (IPC1-7): C08F2/50; G03F7/029; G03F7/031
Attorney, Agent or Firm:
Hotaka Tetsuo