Title:
PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2005234584
Kind Code:
A
Abstract:
To provide photoresists that comprise a blend of at least two distinct phenolic polymers, wherein each polymer has distinct photoacid labile groups from the other polymer, the photoresists exhibiting excellent resolution of a formed image in lithographic processing.
In a photoresist composition, one or preferably both distinct phenolic resins of a blend have extremely low polydispersity values.
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Inventors:
JAMES F CAMERON
Application Number:
JP2005043762A
Publication Date:
September 02, 2005
Filing Date:
February 21, 2005
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/039; G03C1/492; G03F7/004; G03F7/20; H01L21/027; (IPC1-7): G03F7/039; H01L21/027
Domestic Patent References:
| JPH08337616A | 1996-12-24 | |||
| JP2001114822A | 2001-04-24 | |||
| JP2002023368A | 2002-01-23 |
Attorney, Agent or Firm:
Minoru Senda
Koji Hashimoto
Koji Hashimoto