Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTORESIST RELEASING LIQUID
Document Type and Number:
Japanese Patent JP2002053775
Kind Code:
A
Abstract:

To provide a photoresist releasing liquid which is excellent in release properties and corrosion resistance, and can easily be handled from the viewpoint of safety.

The photoresist releasing liquid comprises (a) 45-85 wt.% of a specific alkylhydroxylamine, (b) 3-40 wt.% of a water-soluble organic solvent, preferably a specific alkanolamine, (c) 3-20 wt.% of an aromatic hydroxy compound, and (d) the rest of water.


Inventors:
YOKOI SHIGERU
WAKIYA KAZUMASA
Application Number:
JP2000240955A
Publication Date:
February 19, 2002
Filing Date:
August 09, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
C09D9/00; (IPC1-7): C09D9/00
Attorney, Agent or Firm:
Yoko Hasegawa