PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS

Title:

PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS

Document Type and Number:

Japanese Patent JP2022104895

Kind Code:

A

Abstract:

To provide photoresist topcoat compositions and pattern formation methods.SOLUTION: A topcoat composition comprises a polymer comprising a repeating unit derived from one or more monomers of formula (1) and a solvent, where Z1 and Z2 independently represent a single bond or a substituted or unsubstituted C1-30 alkylene, substituted or unsubstituted C1-30 heteroalkylene, substituted or unsubstituted C3-30 cycloalkylene, substituted or unsubstituted C6-30 arylene, -O-, -C(O)-, -N(R3)-, -S-, or -S(O)2- or the like; R1 and R2 independently represent a substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C6-30 aryl or the like; L is a single bond or a polyvalent linking group; P is a polymerizable group.SELECTED DRAWING: None

Inventors:

JOSHUA KAITZ
BRIAN MALBRECHT
WANG DEYAN
MICHAEL HENRY HOWARD JR

Application Number:

JP2021209660A

Publication Date:

July 12, 2022

Filing Date:

December 23, 2021

Export Citation:

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Assignee:

ROHM & HAAS ELECT MAT
DUPONT ELECTRONICS INC

International Classes:

G03F7/11; C08F220/34; C08F220/56; G03F7/039; G03F7/095; G03F7/20

Domestic Patent References:

JP2001330957A	2001-11-30
JP2012181510A	2012-09-20
JP2015127400A	2015-07-09
JP2013218223A	2013-10-24
JP2018072833A	2018-05-10
JP2016212401A	2016-12-15
JP2015135492A	2015-07-27

Foreign References:

WO2011034176A1

2011-03-24

Attorney, Agent or Firm:

Patent Business Corporation Sender International Patent Office

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