PHOTOSENSITIVE ACID GENERATORS AND PHOTORESISTS COMPRISING THE SAME

Title:

PHOTOSENSITIVE ACID GENERATORS AND PHOTORESISTS COMPRISING THE SAME

Document Type and Number:

Japanese Patent JP2020197729

Kind Code:

A

Abstract:

To provide: new photosensitive acid generator compounds (PAGs) that can be used in both positive and negative photoresist compositions; and photoresist compositions that comprise the compounds.SOLUTION: The invention relates to photosensitive acid generator compounds that generate an α,α-difluoroalkyl sulfonic acid upon exposure to radiation; positive and negative chemically amplified resists that contain such PAGs; and methods for synthesis of such PAGs and α,α-difluoroalkyl sulfonic acids.SELECTED DRAWING: None

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Inventors:

JAMES F CAMERON
ZYDOWSKY THOMAS M

Application Number:

JP2020129030A

Publication Date:

December 10, 2020

Filing Date:

July 30, 2020

Export Citation:

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Assignee:

ROHM & HAAS ELECT MAT

International Classes:

G03F7/004; C07B61/00; C07C17/263; C07C22/08; C07C303/20; C07C303/32; C07C309/24; C07C381/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20; H01L21/027

Domestic Patent References:

JP2000147753A	2000-05-26
JP2002131897A	2002-05-09
JP2002139838A	2002-05-17

Foreign References:

WO2000008525A1

2000-02-17

Attorney, Agent or Firm:

Takuro Saeki
Nakamura Tadashi Exhibition
Yuko Saeki

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