To provide a photosensitive composition for forming a high-definition pattern by having high sensitivity, excellent resolution and very high time passage stability of sensitivity, and to provide a pattern forming material having a photosensitive layer formed by the photosensitive composition, a photosensitive laminate, a pattern forming apparatus, and a pattern forming method.
The photosensitive composition includes at least a binder and a polymerization compound, a photopolymerization initiator based compound, and a polymerization inhibitor. The photosensitive composition contains a compound having, as the photopolymerizasion initiator compound, di-substitution amino benzene as a partial structure. The pattern forming material having the photosensitive layer formed by the photosensitive composition, the photosensitive laminate, the pattern forming apparatus with the photosensitive laminate, and the pattern forming method are provided.
IKEDA TAKAMI
Yoshihiro Nagare
Naoko Matsuda