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Title:
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
Document Type and Number:
Japanese Patent JPH08314135
Kind Code:
A
Abstract:

PURPOSE: To improve aging stability by incorporating novolak resin having a specified mol.wt. and a specified o-quinonediazido compd.

CONSTITUTION: This photosensitive compsn. contains novolak resin consisting of m-cresol and p-cresol and having a mol.wt. of ≥4,500 and ≥30% o- quinonediazido compd. The top of a surface-treated substrate is coated with a photosensitive layer contg. this photo-sensitive compsn. and the layer is dried to obtain the objective photosensitive planographic printing plate. The o- quinonediazido compd. is, e.g., a polycondensed resin having o-quinonediazido groups, e.g., an ester compd. of o-naphthoquinonediazidosulfonic acid with a polycondensed resin consisting of phenol and aldehyde or ketone. The phenol may be o-cresol, m-cresol, p-cresol, 3,5-xylenol or carvacrol.


Inventors:
TONO KATSUHIKO
OTA TOMOHISA
MATSUBARA SHINICHI
Application Number:
JP13851995A
Publication Date:
November 29, 1996
Filing Date:
May 12, 1995
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
MITSUBISHI CHEM CORP
International Classes:
G03F7/004; G03F7/00; G03F7/022; G03F7/023; (IPC1-7): G03F7/022; G03F7/00; G03F7/004; G03F7/023
Attorney, Agent or Firm:
Nobuaki Sakaguchi