PURPOSE: To improve the flexibility and impact resistance of a resin plate by using a photosensitive composition contg. a specified polyvinyl alcohol-base polymer, a specified unsatd. compound and a photopolymn. initiator.
CONSTITUTION: A photosensitive composition is composed essentially of a polyvinyl alcohol-base polymer (a) contg. polyether polyurethane prepd. with aliphatic diisocyanate, an unsatd. compound (b) having a radical polymerizable ethylenic double bond and a photopolymn. initiator (c). A block copolymer of such polyether polyurethane with polyvinyl alcohol or a graft copolymer of such polyether polyurethane as the stock polymer with polyvinyl alcohol as the branch polymer is especially effective as the polyvinyl alcohol-base polymer. When the photosensitive composition is used, a resin plate keeping satisfactory flexibility even at low temp. and humidity and giving high printing quality is obtd.
SATO TOSHIAKI
YAMAUCHI JUNNOSUKE
OKAYA TAKUJI
| JPS5019504A | 1975-03-01 | |||
| JPS5119602A | 1976-02-17 | |||
| JPS51125172A | 1976-11-01 | |||
| JPS55127551A | 1980-10-02 |
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