To provide a support film which has low haze, high transparency and longer length and a method for manufacturing a resist film which uses the support film, a photosensitive element which excels in fining and preservable stability of resist patterns, and a method for manufacturing the same.

The photosensitive element consists of three layers; the support film (A), a photosensitive resin composition (B) and a protective film (C) or the two layers of (A) and (B), in which the support film (A) is formed by laminating the photosensitive resin composition (B) of 1 to 150 μm on a polyethylene terephthalate (PET) or polypropylene film (OPP) made into a structure of three layers or two layers of 5 to 30 μm. General photosensitive characteristics (more particularly resolution and adhesion) are improved by using the multilayered transparent PET.