To provide a photosensitive material processor capable of reducing maintenance operation by allowing crystals of chemical components contained in processing liquid to be hardly stuck onto a side wall internal surface of a development processing tank, and a processing rack.

The photosensitive material processor is equipped with the development processing tank in which the processing liquid for developing photosensitive materials is stored and a refilling mechanism which refills the development processing tank with processing liquid in accordance with processing operation for photosensitive materials in the development processing tank, wherein the development processing tank is provided with an overflow tube 38 for allowing the processing liquid to overflow the development processing tank when exceeding a predetermined liquid level. Further, development processing tanks 31, 32, and 33a are each provided with a liquid level regulating mechanism 43 which varies the liquid level of the processing liquid by moving up and down an intake 38a of the overflow tube 38 by an actuator M1.

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