Title:
PHOTOSENSITIVE POLYSILANE AND PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JPH0413726
Kind Code:
A
Abstract:
PURPOSE:To obtain the title compound for pattern formation material having good sensitivity and resolving property as well as excellent enzyme reactive etching resistance by reacting a polymer having specific recurring units with a specific nitrobenzyl ester. CONSTITUTION:A polymer having recurring units expressed by formula I (R<1> is 1-9C valent hydrocarbon which may have a substituent group) is reacted with a nitrobenzyl ester expressed by the formula A'CO2R<3> [A' is vinyl, alkyl which has terminal olefin bond and is interrupted by an ester group and may contain a substituent group or aromatic containing olefin bond in a substituent group; R<3> is (alpha-substituted) benzyl having nitro group at ortho position] to provide the aimed silane expressed by formula II [A is interrupted by an ester group and is an alkylene which may containing a substituent group or aromatic which contains a substituent group].
Inventors:
AWAJI HIROSHI
KAMIKITA MASAKAZU
MIZUNUMA SATOSHI
KAMIKITA MASAKAZU
MIZUNUMA SATOSHI
Application Number:
JP11626390A
Publication Date:
January 17, 1992
Filing Date:
May 01, 1990
Export Citation:
Assignee:
KANEGAFUCHI CHEMICAL IND
International Classes:
G03F7/039; C08G77/48; C08G77/60; G03F7/075; (IPC1-7): C08G77/60
Attorney, Agent or Firm:
Sota Asahina (2 outside)