Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS5367751
Kind Code:
A
Abstract:
PURPOSE: A specific phospate ester monomer is added to a water-soluble high polymer to provide title resin composition that can be developed with water, and can prevent the waste water from including heavy metals after the developing process.
Inventors:
NAKANO YOSHIO
Application Number:
JP14414576A
Publication Date:
June 16, 1978
Filing Date:
November 30, 1976
Export Citation:
Assignee:
NIPPON SYNTHETIC CHEM IND
International Classes:
C08K5/00; C08F2/00; C08F2/48; C08F2/50; C08F30/00; C08F30/02; C08K5/51; C08K5/52; C08L7/00; C08L21/00; C08L29/00; C08L29/04; C08L33/00; C08L33/02; C08L39/00; C08L101/00; G03F7/00; G03F7/004; H01L21/027; H01L21/312; (IPC1-7): C08F2/50; C08J3/10; C08K5/51; C08L29/04; G03C1/68; G03F7/02; H01L21/312