To provide a photosensitive transfer material and a photomask material with a photosensitive layer having such photosensitivity as to enable pattern formation with light of ≥405 nm wavelength as well as high sensitivity, high mechanical strength, high hardness, and good solvent resistance, to provide a method for producing a photomask from the photosensitive transfer material or the photomask material, and to provide a photomask.

The photosensitive transfer material has on a temporary support at least a photosensitive layer comprising i) at least one alkali-soluble resin binder of formula (1) having polymerizable unsaturated bonds, ii) a monomer having at least one polymerizable unsaturated bond, iii) a photopolymerization initiation system having photosensitivity to light in a long wavelength band of ≥405 nm, and iv) a colorant. In the formula (1), R is H or methyl; X is the residue of a polycarboxylic acid; and n is an integer of 0-20.