Title:
圧電素子
Document Type and Number:
Japanese Patent JP5181649
Kind Code:
B2
Abstract:
A piezoelectric film formed above a Si substrate. The piezoelectric film is formed of a potassium sodium niobate expressed by a general formula (K,Na)NbO3 with perovskite structure. A film thickness of the piezoelectric film is within a range from 0.3 μm to 10 μm. An intermediate film is formed between the Si substrate and the piezoelectric film. The intermediate film generates a stress in a compressive direction in the piezoelectric film.
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Inventors:
Kenji Shibata
Fumito Oka
Fumito Oka
Application Number:
JP2007321591A
Publication Date:
April 10, 2013
Filing Date:
December 13, 2007
Export Citation:
Assignee:
Hitachi Cable Ltd.
International Classes:
H01L41/09; H01L41/18; H01L41/187; H01L41/22; H01L41/316; H01L41/319; H02N2/00
Domestic Patent References:
JP2007184513A | ||||
JP2007042740A | ||||
JP2007165553A | ||||
JP2007088443A | ||||
JP2007287918A | ||||
JP2007134566A | ||||
JP2007042984A | ||||
JP2007294593A | ||||
JP2004224627A |
Attorney, Agent or Firm:
Tadao Hirata
Kenji Tsunoda
Yuji Iwanaga
Keiko Nakamura
Endo Wako
Takashi Nomiyama
Hiroyuki Ito
Kenji Tsunoda
Yuji Iwanaga
Keiko Nakamura
Endo Wako
Takashi Nomiyama
Hiroyuki Ito