To provide a pixel barrier capable of forming pixels with a high degree of location accuracy and no color mixture.
A method of manufacturing a pixel barrier includes the steps of exposing a photosensitive composition for the pixel barrier formed on a substrate under insufficient oxygen atmosphere and developing it to form the pixel barrier having an ink repellent compound. The process of forming the pixel barrier is one method selected from (1) or (5) as follows. In the cross section of the pixel barrier, when the height from the substrate at the highest point thereof is h, a line parallel to the substrate at the position of 0.8h from the substrate is L1, a tangent line at the point where the L1 and the surface of the pixel barrier intersect is L2, a line parallel to the substrate at the point of h is L3, and a distance from the intersection point of L2 and L3 to the pixel barrier is d, d/h is equal to or less than 0.04. (1) A method of kneading the ink repellent compound into the pixel barrier. (5) A method of forming the pixel barrier using a photosensitive transfer material having an adjacent layer containing the ink repellent compound and a photosensitive composition layer for the pixel barrier on a temporary support in this order.
KASHIWAGI DAISUKE
| JP2004053706A | 2004-02-19 | |||
| JP2003091068A | 2003-03-28 | |||
| JP2002156520A | 2002-05-31 | |||
| JP2005060515A | 2005-03-10 | |||
| JP2004151618A | 2004-05-27 | |||
| JP2005036160A | 2005-02-10 | |||
| JP2002131525A | 2002-05-09 |
Kato Kazunori
Hiroshi Fukuda