Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
改質ガスを消費するプラント及び原料ガスを改質する方法
Document Type and Number:
Japanese Patent JP6974402
Kind Code:
B2
Abstract:
A plant that consumes a reformed gas obtained by reforming a source gas including at least methane and carbon dioxide includes: a reforming device that includes a reforming catalyst for reforming the source gas and an electric power supply member for supplying electric power to the reforming catalyst and that supplies electric power to the reforming catalyst to reform the source gas; and a reformed gas consuming apparatus that consumes the reformed gas A reaction temperature of a reforming reaction of the source gas in the reforming device can be adjusted by adjusting a supply amount of a heating medium including exhaust heat generated due to consumption of the reformed gas in the reformed gas consuming apparatus to the reforming device when heat exchange between the source gas and the heat medium is performed in the reforming gas.

Inventors:
Koichiro Yoshitoku
Yukio Tanaka
Keiichi Nakagawa
Application Number:
JP2019157038A
Publication Date:
December 01, 2021
Filing Date:
August 29, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MITSUBISHI HEAVY INDUSTRIES,LTD.
International Classes:
C01B3/38; C01B3/02; C07C27/00; C07C31/04; H01M8/04701; H01M8/04858; H01M8/0612; H01M8/12
Domestic Patent References:
JP2004092520A
JP2013130179A
JP2003002607A
JP6227801A
JP2019206453A
Attorney, Agent or Firm:
Seishin ip patent business corporation



 
Previous Patent: Semiconductor device

Next Patent: Pachinko machine