Title:
PLASMA ELECTRONIC STATE MEASURING DEVICE AND METHOD
Document Type and Number:
Japanese Patent JP2008047501
Kind Code:
A
Abstract:
To provide a method and a device wherein density and temperature of plasma electrons can be measured precisely by a simple device constitution.
A plasma of a first gas and a second gas is made to generate the plasma in a chamber by irradiating laser light to the plasma of the first gas, transmissivity of the laser light by absorption of two quasi-stable states is detected, the density of the first gas in the two quasi-stable states is determined based on the transmissivity, and the electron density and the electron temperature are acquired based on a rate equation in which the respective densities and a formation/extinction process of the respective quasi-stable states are described.
Inventors:
SASAKI KOICHI
IKEDA YUJI
IKEDA YUJI
Application Number:
JP2006224688A
Publication Date:
February 28, 2008
Filing Date:
August 21, 2006
Export Citation:
Assignee:
UNIV NAGOYA
IMAGINEERING KK
IMAGINEERING KK
International Classes:
H05H1/00; H01L21/205; H01L21/3065; H01L21/31
Domestic Patent References:
| JPH03156346A | 1991-07-04 | |||
| JPH07169589A | 1995-07-04 | |||
| JPH06243991A | 1994-09-02 |
Attorney, Agent or Firm:
Wataru Iwakami
Makoto Abe
Michiko Oi
Makoto Abe
Michiko Oi
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