To provide a plasma processing apparatus and a plasma generator which secure the uniformity of processing by acquiring field strength distribution of axial symmetry while preventing a mode jump.
In a processing chamber 1 which makes the interior into a vacuum, there are provided: a window part 3 for introducing microwave; and a placing part 2 for placing an object S to be processed so as to connect a gas introducing guide 11 and an exhaust passage 12. Further, there are provided: a mode converter 5 for supplying microwave of TM mode to the window part 3; and a circular wave guide 6. In the window part 3, a plurality of concentric irregularities 3a are formed in the surface of the side of the interior of the processing chamber 1.
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