Title:
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSED PRODUCT
Document Type and Number:
Japanese Patent JP2020155373
Kind Code:
A
Abstract:
To relatively adjust the discharge intensities of discharge plasma generated on the outer circumference of a tubular electrode and discharge plasma generated below the tubular electrode.SOLUTION: A tubular electrode 120 is configured so that at least a part of the tubular electrode 120 can be located inside a conductive liquid 110 while spaced apart from the conductive liquid 110. A first dielectric material 130 is provided on an outer peripheral surface 121 so as to cover the outer peripheral surface 121 of the tubular electrode 120. A second dielectric material 140 is located below the first dielectric 130 and provided on a lower end surface 122 so as to cover the lower end surface 122 of the tubular electrode 120. The second dielectric material 140 has a communication hole 141 formed therein so that the inside of the tubular electrode 120 and the outside of the tubular electrode 120 communicate with each other through the communication hole 141. A first material constituting the first dielectric 130 and a second material constituting the second dielectric 140 are different from each other.SELECTED DRAWING: Figure 1
Inventors:
MORIKAWA NAOKI
KISHIDA SHIGEFUMI
KISHIDA SHIGEFUMI
Application Number:
JP2019054844A
Publication Date:
September 24, 2020
Filing Date:
March 22, 2019
Export Citation:
Assignee:
AIR WATER INC
International Classes:
H05H1/24; C08J7/00
Attorney, Agent or Firm:
Fukami patent office