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Title:
PLASMA TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP3124204
Kind Code:
B2
Abstract:

PURPOSE: To provide a plasma treatment apparatus which can moderate the deflection of plasma due to E×B drift and which can carry out treatment uniformly on the whole surface of a substrate.
CONSTITUTION: A first electrode 11 and a second electrode 12 facing each other and on which a wafer 13 is mounted are installed in a vacuum container 10. A gas supply system 22 to supply reactive gases and an evacuating system 23 to evacuate the container 10 are connected with the container 10. A high frequency power source 14 to form an electric field between the electrodes 11 and 12 is connected with the electrode 11. A circular magnetic system 30M to form a magnetic field B having a center face crossing the electric field E is installed in the circumference of the container 10. The magnetic system 30M is provided with a plurality of magnet elements having different magnetic directions one another in the center face of the magnetic field B. Electrons drift due to the power produced based on the product E×B wherein the E stands for the electric field and B for the magnetic field. The center face of the magnetic field B is so set as to shift to upper position than the surface to be treated and magnetic fluxes cross the surface to be treated.


Inventors:
Itsuko Sakai
Makoto Sekine
Keiji Horioka
Yukimasa Yoshida
Goichiro Inazawa
Masahiro Ogasawara
Yoshio Ishikawa
Kazuo Eguchi
Application Number:
JP3411095A
Publication Date:
January 15, 2001
Filing Date:
February 22, 1995
Export Citation:
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Assignee:
株式会社東芝
東京エレクトロン株式会社
東京エレクトロン山梨株式会社
International Classes:
H05H1/46; C23C16/50; C23F4/00; H01J37/32; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): H05H1/46; C23C16/50; C23F4/00; H01L21/205; H01L21/3065
Domestic Patent References:
JP7201493A
JP7197253A
JP7197252A
JP7169591A
JP7197255A
Attorney, Agent or Firm:
Takehiko Suzue



 
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