Title:
研磨フィルム、及び該研磨フィルムの製造方法
Document Type and Number:
Japanese Patent JP7102688
Kind Code:
B2
Abstract:
To provide a polishing film which has high durability, can be repeatedly used at many times, prevents damage of a polishing layer and peeling from a base material during polishing, less reduces polishing efficiency, and can be used, especially, for high-accurate polishing in final finishing, and a method for producing the polishing film.MEANS FOR SOLVING THE PROBLEM: A polishing film has a structure in which a base material layer and a polishing layer are laminated through a primer layer, where the primer layer is formed from a primer organic resin composition, and the polishing layer is formed from a resin composition containing inorganic nanoparticles and a water-soluble resin.SELECTED DRAWING: Figure 1
Inventors:
Kentaro Abe
Yasuya Iio
Takashi Mihara
Yasuya Iio
Takashi Mihara
Application Number:
JP2017131650A
Publication Date:
July 20, 2022
Filing Date:
July 05, 2017
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
B24D11/00; B24D3/00
Domestic Patent References:
| JP2010274348A | ||||
| JP2008213140A |
Attorney, Agent or Firm:
Junji Yuda
Noriyuki Takebayashi
Noriyuki Takebayashi