To provide a polishing liquid composition for a magnetic disk substrate capable of reducing surface roughness of the magnetic disk substrate without impairing productivity, and to provide a manufacturing method for a magnetic disk substrate using this.
The polishing liquid composition for the magnetic disk substrate is a polishing liquid composition for a magnetic disk substrate containing water, a silica particle and at least one selected from an acid, a salt of an acid and an oxidizing agent. In the silica particle, a value obtained by dividing an area of a circle making the maximum diameter of the silica particle obtained by measurement by transmission type electronic microscope observation as a diameter by a projection area of the silica particle and multiplying 100 to the obtained value is in a range of 100-130.
YAMAGUCHI TETSUSHI
DOI AKIHIKO
