Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
POLISHING PAD
Document Type and Number:
Japanese Patent JP2016055364
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a polishing pad capable of obtaining sufficient polishing accuracy, when being used for mirror finish polishing.SOLUTION: A polishing pad 1 is pasted with a polishing film 9 on an outer peripheral surface of a circular center base material 7, and the polishing film 9 is formed by a wet film-forming method. By the polishing pad 1, a polishing pad in which the polishing film 9 formed by the wet film-forming method is paster on its outer periphery can be obtained. By final polishing with the polishing film 9 formed by the wet film-forming method, a product which has little distortion of reflection light, little damage, and a stable shape.SELECTED DRAWING: Figure 2

Inventors:
KOIKE KENICHI
TOKUSHIGE SHIN
KASHIWADA FUTOSHI
KURIHARA HIROSHI
Application Number:
JP2014181916A
Publication Date:
April 21, 2016
Filing Date:
September 08, 2014
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24D9/08; B24B29/00; B24D11/00
Domestic Patent References:
JP2006156688A2006-06-15
JP2014069273A2014-04-21
JP2012020349A2012-02-02
JPH07227754A1995-08-29
JPS4635108Y11971-12-03
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Disciple Maru Ken
Ino Sato
Mitsuru Matsushita
Ichiro Kurasawa
Ryohei Yoshino