Title:
POLYARYLENE RESINS
Document Type and Number:
Japanese Patent JP2018095855
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide cyclopentadienone monomers that are useful in forming polyarylene resins having improved solubility in certain organic solvents and are useful in forming polyarylene resin layers useful in electronics applications.SOLUTION: The invention provides cyclopentadienone compounds represented by formula (1) having polar moieties. Also provided are polyarylene resins comprising the compounds and polyalkynyl-substituted monomers represented by formula (2) as polymerized units.SELECTED DRAWING: None
Inventors:
CHARLES R KINZIE
DANIEL GREENE
CHRISTOPHER GILMORE
JAMES F CAMERON
DING PING
WANG QING MIN
KIM YOUNG-SEOK
DANIEL GREENE
CHRISTOPHER GILMORE
JAMES F CAMERON
DING PING
WANG QING MIN
KIM YOUNG-SEOK
Application Number:
JP2017233153A
Publication Date:
June 21, 2018
Filing Date:
December 05, 2017
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C08G61/12; C07C65/40; G03F7/11; H01L21/312; H01L21/768; H01L23/532
Domestic Patent References:
JP2004292554A | 2004-10-21 | |||
JP2000191752A | 2000-07-11 | |||
JP2015030804A | 2015-02-16 | |||
JP2010271654A | 2010-12-02 |
Foreign References:
US4400540A | 1983-08-23 | |||
US7816482B1 | 2010-10-19 |
Other References:
SEOK JIN PARK ET AL.: "Highly phenyl-substituted fluorene copolymers for light-emitting diode", MATERIALS SCIENCE AND ENGINEERING C, vol. 24, JPN6018047590, 2004, pages 99 - 102, XP055455648, ISSN: 0004105835, DOI: 10.1016/j.msec.2003.09.034
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office
Previous Patent: A manufacturing method of resin, a resist composition, and a resist pattern
Next Patent: Polya Lee Wren resin composition
Next Patent: Polya Lee Wren resin composition