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Title:
工業織物用ポリアミドモノフィラメントおよび工業織物
Document Type and Number:
Japanese Patent JP4595060
Kind Code:
B2
Abstract:

To provide a polyamide monofilament for an industrial woven fabric having excellent hydrogen peroxide resistance and high loop strength in combination and suitable as a constituent material for the industrial woven fabric and to provide the industrial woven fabric using the polyamide monofilament.

The polyamide monofilament for the industrial woven fabric comprises specific amounts of a cyanoacrylate light stabilizer and a phenolic antioxidant. The polyamide monofilament has ≥30% strength retention represented by [(A/B)×100] from the tensile strength A after the polyamide monofilament is dipped in an aqueous hydrogen peroxide at 3% concentration kept warm at 80°C for 24 h, then washed with water and air-dried for 24 h and the tensile strength B before the dipping and ≥10 cN/dtex loop strength. The industrial woven fabric is obtained by using the polyamide monofilament.

COPYRIGHT: (C)2007,JPO&INPIT


Inventors:
Akira Kinoshita
Application Number:
JP2005086256A
Publication Date:
December 08, 2010
Filing Date:
March 24, 2005
Export Citation:
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Assignee:
Toray Monofilament Co., Ltd.
International Classes:
D01F6/90; D03D15/00; D21F7/08
Domestic Patent References:
JP2004505984A
JP4503089A
JP4002849A
JP2003055836A
JP6033314A
Attorney, Agent or Firm:
Hiroaki Yoshizawa