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Patent Searching and Data


Title:
POLYETHER RESIN AND METHOD FOR MANUFACTURING IT
Document Type and Number:
Japanese Patent JP2003268101
Kind Code:
A
Abstract:

To provide an organic polymer which is excellent in thermal resistance and chemical resistance and has a low permittivity.

The polyether resin comprises the repeating unit expressed by formula (1) [wherein R1 through R3 are each independently a hydrogen atom, a halogen atom or an optional substituent, and any two groups of them may bind to thereby form a ring; R4 is a hydrogen atom, a 1-10C (substituted) alkyl group, a 6-10C (substituted) cycloalkyl group, a group having a 6-14C (substituted) aromatic ring, a (substituted) trialkylsilyl group or a hydroxyalkyl group; and Ar is a divalent group having an aromatic ring].


Inventors:
YOKOTA AKIRA
Application Number:
JP2002071631A
Publication Date:
September 25, 2003
Filing Date:
March 15, 2002
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08G65/34; C08G65/40; C09D171/00; H01L21/312; (IPC1-7): C08G65/34; C09D171/00; H01L21/312
Attorney, Agent or Firm:
Takashi Kuboyama (2 outside)