Title:
POLYMER COMPOUND FOR PHOTORESIST FOR IMMERSION EXPOSURE AND MANUFACTURING METHOD OF SEMICONDUCTOR
Document Type and Number:
Japanese Patent JP2006169330
Kind Code:
A
Abstract:
To provide a polymer compound for a photoresist for immersion exposure, which is capable of forming a high-performance resist film excellent in water resistance.
The polymer compound for the photoresist for immersion exposure contains a monomer unit containing a cyclic ether skeleton. The monomer unit containing the cyclic ether skeleton used here is at least one monomer unit chosen from formulas (Ia)-(Ig).
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Inventors:
TSUTSUMI KIYOHARU
Application Number:
JP2004362087A
Publication Date:
June 29, 2006
Filing Date:
December 14, 2004
Export Citation:
Assignee:
DAICEL CHEM
International Classes:
C08F220/28; C08F234/02; G03F7/039; H01L21/027
Domestic Patent References:
JP2004333925A | 2004-11-25 | |||
JP2003222999A | 2003-08-08 | |||
JP2002148805A | 2002-05-22 |
Attorney, Agent or Firm:
Yukihisa Goto
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