Title:
Polymerization photo-oxide generating agent
Document Type and Number:
Japanese Patent JP5941280
Kind Code:
B2
Abstract:
A compound has formula (I):
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ Q-O-(A)-Z - G + €ƒ€ƒ€ƒ€ƒ€ƒ(I)
wherein Q is a halogenated or non-halogenated, C 2-30 olefin-containing group, A is a fluorine-substituted C 1-30 alkylene group, a fluorine-substituted C 3-30 cycloalkylene group, a fluorine-substituted C 6-30 arylene group, or a fluorine-substituted C 7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G + has formula (II):
wherein X is S or I, each R 0 is halogenated or non-halogenated and is independently C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 4-30 aryl group; or a combination of these, wherein when X is S, one of the R 0 groups is optionally attached to one adjacent R 0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.
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Inventors:
James W. Sackray
Suzanne M. Corey
Bipple Jane
Owendy Ongay
James F. Cameron
Paul J. La Baume
Ahmad E. Madkul
Suzanne M. Corey
Bipple Jane
Owendy Ongay
James F. Cameron
Paul J. La Baume
Ahmad E. Madkul
Application Number:
JP2011287304A
Publication Date:
June 29, 2016
Filing Date:
December 28, 2011
Export Citation:
Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
C08F20/26; C07C25/18; C07C309/12; C07C309/49; C07C381/12; C09K3/00; G03F7/004; G03F7/039
Domestic Patent References:
| JP2009217253A | ||||
| JP2010095643A | ||||
| JP2011178988A | ||||
| JP2004530921A |
Foreign References:
| WO2008056795A1 | ||||
| WO2010110236A1 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office