Title:
POLYPHENYLENE ETHER RESIN COMPOSITION HAVING EXCELLENT IMPACT RESISTANCE
Document Type and Number:
Japanese Patent JPS6065060
Kind Code:
A
Abstract:
PURPOSE: To provide a resin compsn. having excellent moldability and improved impact resistance, by incoporating a specified copolymer elastomer and an arom. phosphate in a mixture of a polyphenylene ether and a PS resin.
CONSTITUTION: In a process for producing a polyphenylene ether having improved moldability by blending a PS resin such as rubber-modified PS with a polyphenylene ether such as poly(2,6-dimethyl-1,4-phenylene)ether, further an acrylonitrile/conjugated diene compd. copolymer elatomer such as a nitrile rubber composed of 10W50wt% acrylonitrile and 90W50wt% conjugated diene compd. and an arom. phosphate such as cresyl diphenyl phosphate are added to obtain a polyphenylene ether resin compsn. having improved impact resistance.
More Like This:
| WO/2005/111139 | PHENOL FREE STABILIZATION OF POLYETHYLENE FILM |
Inventors:
SUGIO AKITOSHI
SHIYOU MASANOBU
KOBAYASHI TOSHIHIKO
SHIYOU MASANOBU
KOBAYASHI TOSHIHIKO
Application Number:
JP17281883A
Publication Date:
April 13, 1985
Filing Date:
September 19, 1983
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO
International Classes:
C08K5/52; C08K5/49; C08L7/00; C08L21/00; C08L23/00; C08L25/00; C08L25/04; C08L33/00; C08L33/02; C08L47/00; C08L51/00; C08L51/02; C08L55/00; C08L55/02; C08L71/00; C08L71/12; C08L101/00; (IPC1-7): C08K5/52; C08L25/04; C08L47/00; C08L51/00; C08L55/02; C08L71/04