Title:
POLYSILANE FILM COMPOSITION AND CROSSLINKED POLYSILANE FILM
Document Type and Number:
Japanese Patent JP2576312
Kind Code:
B2
Abstract:
PURPOSE: To obtain a compsn. suitable as the material of a semiconductor, etc., and capable of being formed into a film having a solvent resistance, an abrasion resistance and an impact resistance by blending a specific polysilane with polyethynylbenzene, a crosslinking catalyst and an org. solvent.
CONSTITUTION: A polysilane of formula I having SiH groups (R1, R2 and R3 are each a 1-8 C Monovalent hydrocarbon group; R4 is the same as R1, or H, OH or OR1; and m/(m+n)×100=0.5 to 50mol%) is blended with polyethynylbenzene, a crosslinking catalyst, and an org. solvent to obtain a polysilane film compsn. The polysilane to be used is easily obtd., e.g. by the polycondensation of a compd. of formula II with a compd. of formula III using metallic sodium. The polyethynylbenzene is an acetylene compd. having a benzene ring directly bonded to at least two ethynyl groups. Among others, bisethynylbenzene and triethynylbenzene are preferable.
Inventors:
FUKUSHIMA MOTOO
MORI SHIGERU
MORI SHIGERU
Application Number:
JP21467391A
Publication Date:
January 29, 1997
Filing Date:
July 31, 1991
Export Citation:
Assignee:
SHINETSU CHEM IND CO
International Classes:
C08K5/01; C08G77/48; C08G77/60; C08L83/02; C08L83/16; (IPC1-7): C08L83/16; C08G77/60; C08K5/01
Attorney, Agent or Firm:
Takashi Kojima