Title:
POSITION ALIGNING METHOD FOR ELECTRON BEAM EXPOSING APPARATUS
Document Type and Number:
Japanese Patent JPS58102524
Kind Code:
A
Abstract:
PURPOSE:To realize accurate position alignment by eliminating overflow of mark signal so that it is not misconsidered as noise through adjustment of slit width in the vertical direction to the electron beam scanning direction, adjustment of signal to be applied to detector of secondary electron reflection signal and adjustment of a level of signal to be applied to A-D convertor. CONSTITUTION:The electron beam 32 irradiated from an electron gun 31 passes a slit (now shown) having pin holes 33 consisting of a rectangular pattern which allows electron beam to pass, then is deflected by a deflection coil 34 and is irradiated on an Si substrate 35 having position indicating marks. Here, the secondary electron reflected by the position indicating marks is captured by a detector and reaches the input part of a variable gain amplifier. Here an instruction to limit reflection of secondary electron is issued to a driver which closes and opens the slit from a processing unit 12. The width dimension of pin holes 13 of slit is adjusted in accordance with such instruction and thereby amount of electron beam irradiated to the substrate is controlled.
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Inventors:
MIYAZAKI TAKAYUKI
Application Number:
JP20228981A
Publication Date:
June 18, 1983
Filing Date:
December 14, 1981
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01J37/20; G05D3/12; H01J37/304; H01J37/305; H01L21/027; (IPC1-7): H01J37/304; H01J37/305; H01L21/30
Domestic Patent References:
| JPS5583233A | 1980-06-23 |
Attorney, Agent or Firm:
Sadaichi Igita