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Title:
POSITION DETECTION SYSTEM FOR USE IN LITHOGRAPHY EQUIPMENT
Document Type and Number:
Japanese Patent JP3880312
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a reference system which enables reference repeatable with a precision of mobile object, preferably, a submicrometer regarding to a reference frame.
SOLUTION: The position detector comprises a radiation source mounted on an isolated reference frame and a two-dimensional sensor mounted close to the said radiation source. An object for positional detection is topped with a regressive reflector so as to reflect light radiated from the radiation source along a return path which is in parallel with an incident light path but displaced from it. The quantity of displacement depends on the position of the object and is measured by the two-dimensional sensor. Such three devices are combined into a system to measure the position of the object at total six degrees of freedom.


Inventors:
Thomas Josephus Maria, Casten Miller
Andreas Bernardus Geraldus, Ariens
Martinus Hendricks Hendricks, Hoex
Patrick David, Vogelthank
Erik Roelov, Ropestra
Yimbun Patrick, Kwan
Application Number:
JP2000386381A
Publication Date:
February 14, 2007
Filing Date:
December 20, 2000
Export Citation:
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Assignee:
AS M Netherlands B.V.
International Classes:
G01B11/00; H01L21/027; G01B11/03; G01B15/00; G03F7/20; G03F7/22; G03F9/00; (IPC1-7): H01L21/027; G01B11/00; G01B15/00; G03F7/22; G03F9/00
Domestic Patent References:
JP5259031A
JP4140691A
JP11509690A
JP3129720A
JP11233398A
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yukio Iwamoto
Yutaka Yoshida