Title:
POSITIONING DEVICE, LITHOGRAPHY DEVICE, AND ARTICLE PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2023055503
Kind Code:
A
Abstract:
To provide a positioning device advantageous in reducing a deviation between a substrate and a suction holding section.SOLUTION: A positioning device includes: a substrate supporting portion that supports a substrate in a non-contact state by jetting gas against a lower surface of the substrate to levitate the substrate; a plurality of suction-holding portions for sucking the lower surface of the substrate supported in a non-contact state by the substrate supporting portion to restrict displacement of the substrate in a direction parallel to the substrate surface; a support member for supporting the plurality of suction-holding portions; and a rotating mechanism for rotating the substrate via the plurality of suction-holding portions by rotating the support member about an axis intersecting with the substrate surface.SELECTED DRAWING: Figure 2B
Inventors:
KANEKO SHINYA
Application Number:
JP2021164935A
Publication Date:
April 18, 2023
Filing Date:
October 06, 2021
Export Citation:
Assignee:
CANON KK
International Classes:
G03F7/20; H01L21/027; H01L21/68
Attorney, Agent or Firm:
Patent Attorney Corporation Otsuka International Patent Office