Title:
POSITIVE PHOTORESIST COATING LIQUID AND DISPLAY DEVICE SUBSTRATE USING SAME
Document Type and Number:
Japanese Patent JP3640290
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a non-chemical amplifying positive photoresist coating liquid which enables formation of a coating film with uniform thickness all over a substrate, produces no particle and is excellent in storage stability, and to provide a base body for a display device.
SOLUTION: The non-chemical amplifying positive photoresist coating liquid is prepared by dissolving an alkali-soluble resin and quinone diazide group-contg. compd. in a mixture solvent comprised of 60 to 98 wt.% propylene glycol monomethylether acetate or 3-methoxy methylpropionate and 40 to 2 wt.% γ-butylolactone. The resultant coating liquid is applied to form a coating film on a glass square substrate to obtain a base body for a display device.
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Inventors:
Tetsuya Kato
Chisaburo Aoki
Chisaburo Aoki
Application Number:
JP28076698A
Publication Date:
April 20, 2005
Filing Date:
October 02, 1998
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/022; (IPC1-7): G03F7/022; G03F7/004
Domestic Patent References:
| JP7043899A | ||||
| JP7098503A | ||||
| JP7072622A | ||||
| JP10148935A | ||||
| JP8286365A | ||||
| JP10133377A |
Attorney, Agent or Firm:
Aun Agata