Title:
POSITIVE PHOTORESIST COMPOSITION FOR MANUFACTURE OF LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2003195496
Kind Code:
A
Abstract:
To provide a positive photoresist composition excellent in the linearity suitable for the manufacture of a system LCD, suitable for the exposure process under the condition of low NA and suitable for the i-line exposure and to provide a method for forming a resist pattern.
The composition is prepared by dissolving (A) an alkali-soluble resin and (B) a quinonediazide esterified compound expressed by general formula (I) in (D) an organic solvent. In formula (I), D represents a hydrogen atom or a 1,2-naphthoquinonediazide-5-sulfonyl group.
Inventors:
MIYAGI MASARU
TATE TOSHISATO
HIRATA ATSUKO
TATE TOSHISATO
HIRATA ATSUKO
Application Number:
JP2001394444A
Publication Date:
July 09, 2003
Filing Date:
December 26, 2001
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/022; G03F7/004; G03F7/008; H01L21/027; (IPC1-7): G03F7/022; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Soga Doteru (6 people outside)
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