Title:
POSITIVE PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2003156848
Kind Code:
A
Abstract:
To provide a positive photosensitive composition excellent in suitability to halftone exposure (side lobe resistance) and less liable to cause development defects.
The positive photosensitive composition comprises (A) a compound which generates an acid upon irradiation with an active ray or radiation, (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution and (C) a nitrogen-containing compound containing at least one fluorine atom.
Inventors:
FUJIMORI TORU
Application Number:
JP2001357766A
Publication Date:
May 30, 2003
Filing Date:
November 22, 2001
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F220/10; C08F232/00; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F220/10; C08F232/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)