Title:
POSITIVE PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2003330194
Kind Code:
A
Abstract:
To provide a positive photosensitive composition free from problems relating to tailing in a pattern profile or line edge roughness so as to solve problems in the techniques to improve the performance of microphotofabrication using far UV rays, in particular, ArF excimer laser light.
The positive photosensitive composition contains (A) a compound which generates an acid by radiation of active rays or radiation and (B) a resin which has a cyanide group in the side chain and is decomposed by the effect of an acid to increase the solubility in an alkali developer liquid.
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Inventors:
SATO KENICHIRO
Application Number:
JP2002138810A
Publication Date:
November 19, 2003
Filing Date:
May 14, 2002
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F2/50; C08F216/18; C08F220/12; C08F222/06; C08F222/40; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F2/50; C08F216/18; C08F220/12; C08F222/06; C08F222/40; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)