POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, ORGANIC EL DISPLAY AND LIQUID CRYSTAL DISPLAY

Japanese Patent JP2011013390

A

To provide a positive photosensitive resin composition for an interlayer insulating film which is excellent in insulation and retains high transparency even when baked at a high temperature, an interlayer insulating film using the same, and an organic EL display and a liquid crystal display including the interlayer insulating film.

The positive photosensitive resin composition for an interlayer insulating film includes (A) an alkali-soluble resin containing an acrylic repeating unit, (B) a 1, 2-quinonediazide compound, and (C) a compound having at least two partial structures represented by formula (I) within a molecule and having a molecular weight of 600-2,000, wherein R1 and R2 each independently represent methyl or t-butyl, provided that at least one of R1 and R2 is t-butyl; and R3 represents -O- or -NH-.

WO/2011/145702	RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND
JPH0580503	PHOTOSENSITIVE TRANSFER MATERIAL AND IMAGE FORMING METHOD
JPH09132738	PHOTOSENSITIVE COATING LIQUID AND PRODUCTION OF PHOTOSENSITIVE PRINTING PLATE USING THE SAME COATING LIQUID

SUGIHARA KOICHI
YAMADA SATORU

JP2009156426A

January 20, 2011

June 30, 2009

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FUJIFILM CORP

G03F7/004; G03F7/023; H01L51/50; H05B33/22

JPH05273751A	1993-10-22
JP2001100416A	2001-04-13
JP2009116223A	2009-05-28
JP2007033518A	2007-02-08
JP2007017726A	2007-01-25
JP2004004233A	2004-01-08
JP2009251538A	2009-10-29

WO2005096100A1

2005-10-13

Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda

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