Title:
POSITIVE RESIST COMPOSITION USING FLUOROCOPOLYMER
Document Type and Number:
Japanese Patent JP3907485
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a positive resist composition having highly transparency to radiations ranging from vacuum ultraviolet rays to visible rays, good adhesion to substrates, high film-forming properties, etc., and comprising a new fluorocopolymer and an acid generator.
SOLUTION: The positive resist composition comprises a fluorocopolymer essentially consisting of at least an α-fluoroalkylacrylic monomer with a moiety represented by formula (1) and a vinyl ether with a moiety represented by formula (2) and an acid generator.
Inventors:
Kazuhiko Maeda
Haruhiko Komoriya
Kazuhiro Yamanaka
Haruhiko Komoriya
Kazuhiro Yamanaka
Application Number:
JP2002010909A
Publication Date:
April 18, 2007
Filing Date:
January 18, 2002
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
G03F7/039; C08F2/44; C08F212/14; C08F216/14; C08F220/24; C08F232/04; C08F261/06; H01L21/027; (IPC1-7): C08F2/44; C08F261/06; G03F7/039; H01L21/027
Domestic Patent References:
| JP60042411A | ||||
| JP9043848A | ||||
| JP2002293840A | ||||
| JP2002006501A | ||||
| JP4052648A |
Attorney, Agent or Firm:
Yoshiaki Hanada
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