Title:
POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2003330195
Kind Code:
A
Abstract:
To provide a positive resist composition which significantly decreases development defects and gives an excellent square profile.
The positive photoresist composition contains (A) a resin which contains a repeating unit having a specified partial structure with an alicyclic hydrocarbon in a side chain and a repeating unit having an alicyclic hydrocarbon in the main chain and which increases the dissolving rate with an alkali developer liquid by the effect of an acid, (B) a compound which generates an acid by radiation of active rays or radiation, and (C) a specified Meldrum's acid compound.
Inventors:
FUJIMORI TORU
Application Number:
JP2002279433A
Publication Date:
November 19, 2003
Filing Date:
September 25, 2002
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F220/10; C08F232/00; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F220/10; C08F232/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)