Title:
Positive resist material and a pattern formation method
Document Type and Number:
Japanese Patent JP6003855
Kind Code:
B2
Inventors:
Yoshinori Hirano
Hideyoshi Yanagisawa
Hideyoshi Yanagisawa
Application Number:
JP2013190253A
Publication Date:
October 05, 2016
Filing Date:
September 13, 2013
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/023; G03F7/075
Domestic Patent References:
| JP3056964A | ||||
| JP9152711A | ||||
| JP3097710A | ||||
| JP63237052A | ||||
| JP63292130A | ||||
| JP58048045A | ||||
| JP2003119344A | ||||
| JP2000194126A | ||||
| JP2006522354A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki