Title:
ポジ型光像形成性底面反射防止コーティング
Document Type and Number:
Japanese Patent JP5604734
Kind Code:
B2
Abstract:
The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
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Inventors:
パトマナ van muni ラスナ
チャクラパニ スリニバサン
Haole Anne Francis M
宮ざき Shinji
NG Edward W
Nasar Mark Ore
チャクラパニ スリニバサン
Haole Anne Francis M
宮ざき Shinji
NG Edward W
Nasar Mark Ore
Application Number:
JP2012531508A
Publication Date:
October 15, 2014
Filing Date:
November 12, 2009
Export Citation:
Assignee:
AZ Electronic Materials (Japan) IP incorporated company
International Classes:
G03F7/095; G03F7/004; G03F7/038; G03F7/039; G03F7/11; H01L21/027
Attorney, Agent or Firm:
Mitsufumi Ezaki
Minoru Kajisawa
Yoshinori Uenishi
Ichiro Torayama
Minoru Kajisawa
Yoshinori Uenishi
Ichiro Torayama