Title:
POSITIVE TYPE PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP3890376
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a positive photosensitive compsn. having high resolving power and high sensitivity and in which a superior resist pattern is obtained by using a ternary resin having a specified structure and a specified compd. which generates an acid in a positive chemical amplification system.
SOLUTION: A positive photosensitive compsn. contains compd. represented by formula I or the like which generates sulfonic acid irradiated with active light or radiation and a resin which contains repeating units having the structure represented by formulae II-IV, is decomposed by the action of the acid and increases its solubility in an alkali developer. In the formula I, R1-R3 are each an H atom, an alkyl, a cycloalkyl group or the like and X is an anion of benzenesulfonic acid, naphthalenesulfonic acid or the like. In the formulae II-IV, R21 is an H atom or a methyl group, R22 is a group which is decomposed by the action of acid, R23 is a group which is not decomposed by the action of the acid, R24 is an H atom, a halogen atom, an alkyl group or the like and (n) is an integer of 1-3.
Inventors:
Toru Fujimori
Toshiaki Aoi
Shiro Tan
Kazuya Uenishi
Toshiaki Aoi
Shiro Tan
Kazuya Uenishi
Application Number:
JP27457797A
Publication Date:
March 07, 2007
Filing Date:
October 07, 1997
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; G03F7/039; C07C381/12; H01L21/027; (IPC1-7): G03F7/004; C07C381/12; G03F7/039; H01L21/027
Domestic Patent References:
| JP9211864A | ||||
| JP6214395A | ||||
| JP8123032A | ||||
| JP6273935A | ||||
| JP8314142A | ||||
| JP8027094A | ||||
| JP7319155A | ||||
| JP6199770A | ||||
| JP5152717A |
Foreign References:
| EP0780732A1 |
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa