To ensure high sensitivity and to form a superior resist pattern by incorporating a resin having groups which are decomposed by the action of an acid and increase solubility in an alkali developer and a specified compd. generating sulfonic acid when irradiated with active light or radiation.
This comps. contains a resin having groups which are decomposed by the action of an acid and increase solubility in an alkali developer and a compd. represented by formula I or II and generating sulfonic acid when irradiated with active light or radiation. In the formulae I, II, each of R1-R5 is H, alkyl, cycloalkyl, etc., R6 is alkyl or aryl, X- is an anion of benzene-, naphthalene- or anthracenesulfonic acid having a group selected from among R7-CO, R8-CONH-, R9-NHCO-, etc., and nitro, R7 is H, alkyl, etc., and each of R8 and R9 is alkyl, cycloalkyl, etc.
KODAMA KUNIHIKO
SATO KENICHIRO
UENISHI KAZUYA
YAMANAKA TSUKASA
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