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Patent Searching and Data


Title:
PRESSURE SENSOR
Document Type and Number:
Japanese Patent JP2008045911
Kind Code:
A
Abstract:

To provide a semiconductor pressure sensor which can be used even under high-pressure environments, by preventing the separation between a semiconductor substrate and a support substrate and preventing damages to a diaphragm.

In the cross section along the thickness direction N of the semiconductor substrate 11, inner surfaces 13a, 13b of a cavity section 13 of the semiconductor substrate 11 and a surface 12a of the support substrate 12 that adjoins an angle , respectively. The angles form an acute angle so that they face each other, directed toward the inside S of the cavity section 13. In the present embodiment, for example, the inner surfaces 13a, 13b form a tapered shape, in which the angle gradually decreases from a direction along the thickness direction N of the semiconductor substrate 11 in a direction along the surface 12a of the support substrate 12.


Inventors:
SHIOJIRI TAKESHI
HASHIMOTO MIKIO
Application Number:
JP2006219695A
Publication Date:
February 28, 2008
Filing Date:
August 11, 2006
Export Citation:
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Assignee:
FUJIKURA LTD
International Classes:
G01L9/00; H01L29/84
Domestic Patent References:
JP2004325220A2004-11-18
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama