PURPOSE: To obtain the material useful in excimer laser lithography by forming a layer containing a polyglycidyl acrylate and a light absorbent for low wave length between the base and the photosensitive resin layer to prevent the irregu lar reflection of irradiation light from the base and development of stationary waves.
CONSTITUTION: This primer material contains a polyglycidyl acrylate (preferably having 5,000 to 300,000 weight-average molecular weight) and a light absorbent having an absorption in less than 400nm wavelength, preferably an azo compound of formula I {R1-R5 each is H, a halogen, a (substituted) alkyl, alkoxy, OH, nitro, -COOR7 [R7 is H or a (substituted) alkyl]; R6 is formula II (R8 is an alkyl), a (substituted) naphthyl, formula III [R9, R10 are H, a (substituted) alkyl, an aryl]}.
KUSUMOTO TAKEHIRO
YAMAMOTO SHIGEKI
OKA HIROMI
NAKANO YOSHIKO
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