PROCESSING DEVICE, PROCESSING METHOD, AND MANUFACTURING METHOD OF PATTERN SUBSTRATE

Title:

PROCESSING DEVICE, PROCESSING METHOD, AND MANUFACTURING METHOD OF PATTERN SUBSTRATE

Document Type and Number:

Japanese Patent JP2010044310

Kind Code:

A

Abstract:

To provide a processing device and a processing method for easily and surely carrying out processing for a contaminant, and to provide the manufacturing method of a pattern substrate.

The processing device for carrying out processing for the contaminant 15 on a mask 10 where a pellicle film 12 is mounted via a pellicle frame 11 includes: a stage 21 on which the mask is placed; and a light source 23 for emitting infrared light to the mask placed on the stage via the pellicle film. Besides, a cooling means 27 for cooling the mask can be provided and water can be coagulated on the pattern surface of the mask.

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Inventors:

KUSUSE HARUHIKO
SAKUMA JUN
TAKEHISA KIWAMU
KATO MASAYUKI
IWAGAYA TERUYOSHI
AMANO YUTAKA

Application Number:

JP2008209680A

Publication Date:

February 25, 2010

Filing Date:

August 18, 2008

Export Citation:

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Assignee:

LASERTEC CORP
PRE TECH CO LTD

International Classes:

G03F1/62; G03F1/64; G03F1/82; H01L21/027

Attorney, Agent or Firm:

Ken Ieiri
Yasuhiro Iwase

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