Title:
PROCESSING DEVICE AND METHOD THEREFOR
Document Type and Number:
Japanese Patent JP3195316
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a processing device which can make clean air flow uniformly into a processing space.
SOLUTION: A processing device is provided with a boarding base 70 which processes a substrate by boarding thereon, a covering member which is provided above the boarding base, a temperature control means 70 which is provided on the boarding base for heating or cooling process of the substrate, a shutter member 78 which is provided for free elevating and descending, and for covering around the processing space on the boarding base and an elevating and descending means for the shutter member. In this case the shutter member is so constituted as to move in the direction of closing within the processing space S, from downward direction to upper direction of the processing space.
Inventors:
Koji Harada
Akira Yonemizu
Takashi Yoshinaga
Akira Yonemizu
Takashi Yoshinaga
Application Number:
JP20393699A
Publication Date:
August 06, 2001
Filing Date:
June 01, 1992
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; (IPC1-7): H01L21/027
Domestic Patent References:
| JP178024U |
Attorney, Agent or Firm:
Akihiro Asai