PURPOSE: To provide the process for production of the color filter substrate for a thin-film transistor type liquid crystal display device having high reliability by adopting such a substrate structure to which the dust itself does not stick.

CONSTITUTION: A stage for forming light shielding layers 11 in prescribed patterns on a glass substrate 10, forming color filter layers 12 in a display region 1 on this substrate and forming a flattening layer 13 over the entire surface of the substrate, a stage for forming a conductive film outside the display region 1 and cutting line 4 and forming a counter electrode 14 in the display region and conductive coating electrodes 15 outside the cutting line 4, a stage for forming an oriented film 16 in an oriented film region and a stage for subjecting this oriented film 16 to a rubbing treatment are executed.