PURPOSE: To produce extremely pure water having high purity by subjecting the org. material in water to be treated to oxidation decomposition by the irradiation of light in the presence of a photocatalyst formed by depositing group VIII metal of periodic table and/or the oxide thereof on a fine particulate inorg. semiconductor.
CONSTITUTION: The photocatalyst is prepd. by depositing about 0.1W15wt% group VIII metal (e.g., Pt) and/or the oxide thereof (e.g., RuO2) on the fine particulate inorg. semiconductor (e.g., TiO2, CdS). The org. material contained in the water to be treated is subjected to the oxidation decomposition by the irradiation of the light (e.g., irradiation of the light by 500W high pressure mercury lamp) in the presence of such photocatalyst. Such treatment stages is combined with a known technique for producing the ultrapure water, by which the extremely pure water having high purity is produced more efficiently than by the conventional technique.
SATO HISAO
OOTA YOSHIHARU
| JPS60118236A | 1985-06-25 | |||
| JPS60118289A | 1985-06-25 |
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